Particle Formation from Gases

TOPIC AREAS The Significance of PT Formation from Gas Formation from Liquid Comminution, Attrition Size Enlargement Particle Physics Particle Characterization:    Non-Optical Methods    Optical Methods Storage / Discharge:    Mechanics: wall stress    Dynamics: flow Pneumatic Conveying Fluidized Bed Mixing and De-mixing Separation by Size P./Gas Separation P./Liquid Separation Dispersion in Fluids Rheology Reaction Heating, Drying Safety Simulation, Modeling Specific Applications ERPT Home Page

Web Sites of Educational Interest Precipitation from supercritical solvents       by S. Howdle (Univ. of Nottingham) a two page article describing the use of an anti-solvent additive -- http://www.nottingham.ac.uk/supercritical/scantsol.html. Formation of nanoparticles using a plasma reactor       by C.C.Berndt, A.H.King, T.Chraska (SUNY at Stony Brook)       and J.Karthikeyan (Heany Industries) A survey of processes available for synthesis -- http://www.matscieng.sunysb.edu/tsl/ctsr/nuggets/nugget1/. Preparation of Thin Films The following links go to brief descriptions of several methods for preparing thin films of volatile or non-volatile materials on a substrate. The substrate on which the film is produced may be a bulk surface (a flat plate, for example) or a particulate material (pulverized flakes, for example). Thanks to American Elements for recommending these links:     Physical Vapor Deposition by Evaporation       -- www.siliconfareast.com/evaporation.htm     Physical Vapor Deposition by Sputtering       -- www.siliconfareast.com/sputtering.htm       Sputtering is the most widely-used method of preparing       thin films for VLSI (very large scale integrated circuits)     Chemical Vapor Deposition       -- www.siliconfareast.com/cvd.htm

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